CVD Equipment Corporation is engaged in developing, designing, manufacturing and servicing a range of chemical vapor deposition, gas control and other equipment and solutions. The Company’s segments include CVD/First Nano, SDC, and CVD Materials. The CVD/First Nano supplies chemical vapor deposition systems for use in the research, development and manufacturing of aerospace, medical components, semiconductors, light-emitting devices (LEDs), battery nanomaterial, carbon nanotubes, nanowires, solar cells, and a number of other industrial applications. The SDC segment designs and manufactures ultra-high purity gas and chemical delivery control systems for semiconductor fabrication processes, solar cells, LEDs, carbon nanotubes, and nanowires. The CVD Materials segment includes elements and product groups, such as Tantaline and MesoScribe. Tantaline treatment is a diffusion-bonded protective layer of tantalum formed by chemical vapor deposition on the surface of common materials.
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